Photolithography technology refers to the process of transferring patterns from a mask onto a substrate using photoresist under light exposure (typically ultraviolet, deep ultraviolet, or extreme ultraviolet light).
It is one of the most critical processes in semiconductor manufacturing.

The cost of photolithography accounts for approximately one-third of the total wafer manufacturing cost, while its time consumption represents about 40%–60% of the entire process. As semiconductor feature sizes continue to shrink, photolithography processes require increasingly strict control of contaminants.

This includes not only strict particle control, but also extremely low precipitation requirements. To meet these demands, Henan Clande Filter Technology Co., Ltd. provides advanced filtration products with high efficiency, excellent cleanliness, and strong chemical resistance, suitable for various SEMI photolithography applications.